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INSTITUTE OF PHYSICS, UNIVERSITY OF GREIFSWALDCHAIR OF EXPERIMENTAL PHYSICS: INTERFACE PHYSICSExperimentalphysik II - Grenzflächenphysik, Prof. Dr. Rainer Hippler |
2000
Books, Monographies, Chapters in Books
- Hippler, R.
Fundamental Processes of Plasma-Surface Interactions
In: Advances in Atomic, Molecular, and Optical Physics, Vol 43, p. 341 (2000)
Journals
- Kersten, H., Stoffels, E., Stoffels, W.W., Otte, M., Csambal, C., Deutsch, H., Hippler, R.
Energy influx from an rf plasma to a substrate during plasma processing
J. Appl. Phys. 87(8), 3637-3645 (2000) - Güvenç, Z.B., Hundur, Y., Hippler, R.
Sputtering yield and dynamical analysis of Ni(100) surface: A comparison of four different Ar-surface interaction potentials
Nucl. Instr. Meth. Phys. Res. B 164/165, 854-860 (2000) - Kersten, H., Rohde, D., Berndt, J., Deutsch, H., Hippler, R.
Investigations on the energy influx at plasma processes by means of a simple thermal probe
Thin Solid Films 377-378, 585 (2000) - Quaas, M., Steffen, H., Hippler, R., Wulff, H.
The growth process of plasma-deposited ITO films investigated by grazing incidence X-ray techniques
Surface Science, 454-456, 790-795 (2000) - Wulff, H., Quaas, M., Steffen, H., Hippler, R.
In situ studies of diffusion and crystal growth in plasma deposited thin ITO-films
Thin Solid Films 377-378, 418 (2000) - Quade, A., Wulff, H., Steffen, H., Tun, T.M., Hippler, R.
Investigation of the aluminium oxydation in an oxygen plasma excited by microwaves
Thin Solid Films 377-378, 626 (2000) - Kersten, H., Stoffels, E., Stoffels, W.W., Otte, M., Csambal, C., Deutsch, H., Hippler, R.
On the energx influx from an rf pülasma to a substrate during plasma processing
J. Appl. Phys. 87, 3637-645 (2000) - Hippler, R.
Fundamental Process of Plasma-Surface Interactions
Adv. Atom. Mol. Opt., Phys. 43, 341-371 (2000) - Kersten, H., Rohde, D., Deutsch, H., Hippler, R., Stoffels, W.W., Stoffels, E., Kroesen, G.M.W., Berndt, J.
Investigations on the Energy Influx at Plasma Surface Processes
Acta Physica Slovaca 50, 439-459 (2000) - Steffen, H., Wulff, H., Quaas, M., Tun, T.M., Hippler, R.
Diffusion and crystal growth in plasma deposited ITO films
Acta Physica Slovaka 50, 667-672 (2000)