INSTITUTE OF PHYSICS, UNIVERSITY OF GREIFSWALDCHAIR OF EXPERIMENTAL PHYSICS: INTERFACE PHYSICSExperimentalphysik II - Grenzflächenphysik, Prof. Dr. Rainer Hippler |
2001
Books, Monographies, Chapters in Books
- Williams, J.F., Hippler, R.
A "Laudatio" for Professor Hans Kleinpoppen
In: Complete Scattering Experiments, Proc. of the Hans Kleinpoppen Symposium (U. Becker, A. Crowe, Hrsg.)
Kluwer Academic/Plenum: New York, p. 1 (2001) - Hippler, R., Pfau, S., Schmidt, M., Schoenbach, K.H., Eds.
Low Temperature Plasma Physics - Fundamental Aspects and Applications
Wiley-VCH: Berlin (2001) - Hippler, R.
Fundamental Processes of Plasma-Surface Interactions
In: Low Temperature Plasma Physics - Fundamental Aspects and Applications
(R. Hippler, S. Pfau, M. Schmidt, K.H. Schoenbach, Eds.)
Wiley-VCH: Berlin, S. 79 (2001)
Journals
- Quaas, M., Steffen, H., Hippler, R., Wulff, H.
Amorphous-to-crystalline transformation of thin ITO films studied by in-situ grazing incidence X-ray diffractometry
Mat. Sci. Forum 378-381, 320 (2001) - Kersten, H., Rohde, D., Deutsch, H., Hippler, R., Swinkels, G.H.P.M., Stoffels, W.W., Kroesen, G.M.W.
On the determination of energy fluxes at plasma-surface processes
Appl. Phys. A 72, 531 (2001) - Kersten, H. Deutsch, H., Stoffels, E., Stoffels, W.W., Kroesen, G.M.W., Hippler, R.
Micro-Disperse Particles in Plasmas: From Disturbing Side Effects to New Applications
Contrib. Plasma Phys.41, 598 (2001) - Rohde, D., Pecher, P., Kersten, H., Jacob, W., Hippler, R.
The energy influx during plasma deposition of amorphous hydrogenated carbon films
Surface and Coatings Techn. 149, 206 (2001) - Quade, A., Wulff, H. Steffen, H., Hippler, R.
Determination of diffusion coefficients and sputter rates for the plasma activated Al oxidation
Surface and Interface Analysis (2001), submitted - Sonnenfeld, A., Tun, V, Zajíèková, L., Kozlov, K.V., Wagner, H.-E., Behnke, J.F., Hippler, R.
Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison
Plasma and Polymers 6, 237 (2001) - Kersten, H., Deutsch, H., Steffen, H., Kroesen, G.M.W., Hippler, R.
The energy balance at substrate surfaces during plasma processing,
Vacuum 63, 385 (2001)