2005

Books, Monographies, Chapters in Books

  1. Do, H.T., Thieme, G., Hippler, R.
    Energy distribution of ion species in Ar/CH4, Ar/C2H2, and ArC3H8 radio-frequency plasmas
    In: Boufendi, L., Mikikian, M., Shukla, P.K. (Hrsg.), New Vistas in Dusty Plasma, Proc. Fourth International Conference on the Physics of Dusty Plasmas. 1. Aufl., AIP Conference Proceedings 799, 375 (2005)

 

Journals

  1. Güvenç, Z.B., Hippler, R., Jackson, B.,
    Bombardment of Ni(100) surface with low-energy argon atoms: molecular dynamics simulations
    Thin Solid Films 474(1-2), 346-357 (2005)

  2. Kersten, H., Wiese, R., Hannemann, M., Kapitov, A., Scholze, F., Neumann, H., Hippler, R.
    Plasma and ion beam characterization by non-convential methods
    Surface and Coatings Technology 200(1-4), 809-813 (2005)

  3. Kersten, H., Thieme, G., Fröhlich, M., Bojic, D., Tung ,D.H., Quaas, M., Wulff, H., Hippler, R.,
    Complex (dusty) plasmas: Examples for applications and observation of magnetron-induced Phenomena
    Pure Appl. Chem. 77, 415-428 (2005)

  4. Kuzmichev, A., Bevza, O., Steffen, H., Hippler, R.
    Impact excitation of MF magnetron discharge for PVD processes
    Vacuum 78, 611-615 (2005)

  5. Wolter, M., Do, H.T., Steffen, H., Hippler, R.
    Aluminium atom density and temperature in a dc magnetron discharge determined by means of blue diode laser absorption spectroscopy
    J. Phys. D: Appl. Phys. 38, 2390-2395 (2005)

  6. Hippler, R., Wrehde, S., Straňák, V., Zhigalov, O., Steffen, H., Tichý, M., Quaas, M., Wulff, H.
    Characterization of a Magnetron Plasma for Deposition of Titanium Oxide and Titanium Nitride Films
    Contrib. Plasma Phys. 45, No. 5-6, 348 - 357 (2005)

  7. Do, H.T., Thieme, G., Fröhlich, M., Kersten, H., Hippler, R.
    Ion Molecule and Dust Particle Formation in Ar/CH4, Ar/C2 H2 and Ar/C3H6 Radio-frequency Plasmas
    Contrib. Plasma Phys. 45, No. 5-6, 378-384 (2005)

  8. Majumdar, A., Behnke, J.F., Hippler, R., Matyash, K., Schneider, R.
    Chemical Reaction Studies in CH4/Ar and CH4/N2 Gas Mixtures of a Dielectric Barrier Discharge
    J. Phys. Chem. A 109, 9371-9377 (2005)

  9. Kersten, H., Rohde, D., Steffen, H., Deutsch, H., Hippler, R.
    Die Bestimmung von Energieflüssen bei Plasmaoberflächenprozessen
    Fachzeitschrift Galvanotechnik 12: 2996-3007 (2005)


 

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