1. Straňák, V., Block, S., Drache, S., Hubička, Z., Helm, C.A., Jastrabík, L., Tichý, M., Hippler, R.
    Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system
    Surf. Coat. Technol. 205, 2755-2762 (2011)

  2. Straňák, V., Drache, S., Cada, M., Hubička, Z., Tichý, M., Hippler, R.
    Time-Resolved Diagnostics of Dual High Power Impulse Magnetron Sputtering With Pulse Delays of 15 μs and 500 μs
    Contrib. Plasma Phys. 51, 237-245 (2011)

  3. Thejaswini, H.C., Majumdar, A., Tun, T.M., Hippler, R.
    Plasma chemical reactions in C2H2/N2, and C2H6/N2 gas mixtures of a laboratory dielectric barrier discharge
    Adv. Space Res.48, 857-861 (2011)

  4. Straňák, V., Wulff, H., Rebl, H., Zietz, C., Arndt, K., Bogdanowicz, R., Nebe, B., Bader, R., Podbielski, A., Hubička, Z., Hippler, R.
    Deposition of thin titanium-copper films with antimicrobial effect by advanced magnetron sputtering methods
    Mat. Sci. Eng. C 31, 1512-1519 (2011)

  5. Straňák, V., Wulff, H., Bogdanowicz, R., Drache, S., Hubička, Z., Cada, M., Tichý, M., Hippler, R.
    Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges
    Eur. Phys. J. D 64, 427-435 (2011)

  6. Hippler, R., Krupinski, R.
    Energy dependence of small silver clusters sputtered by 150 keV Ar+ ions
    Nucl. Instrum. Meth. Phys. B 269, 3209-3211 (2011)


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