INSTITUTE OF PHYSICS, UNIVERSITY OF GREIFSWALD

Dr. Abhijit Majumdar

Publications:

1. Abhijit Majumdar, Ramesh Ummanni, Karsten Schröder, Reinhard Walther, Rainer Hippler, Cancer cells (MCF-7, Colo-357 and LNCaP) viability on amorphous hydrogenated carbon nitride film deposited by dielectric barrier discharge plasma“, J. Appl. Phys, (in press) 2009.
2. Abhijit Majumdar, S.R. Bhattacharayya, Rainer Hippler, Rapid thermal annealing effect on amorphous hydrocarbon film deposited by CH₄/Ar dielectric barrier discharge plasma on Si wafer: Surface Morphology and Chemical evaluation, J. Appl. Phys., 105, (2009), 1.
3. Abhijit Majumdar, Gudrun Scholz, Rainer Hippler, Structural characterization of amorphous hydrogenated-carbon nitride (aH-CN_x) film deposited by CH₄/N₂ dielectric barrier discharge plasma: 13C, 1H Solid State NMR, FTIR and Elemental analysis, Surf. Coat. Technol., 203, (2009), 2013-2016.
5. Abhijit Majumdar, Marina Ganeva, D. Köpp, D. Datta, P. Mishra, S.R. Bhattacharayya, D. Ghose, Rainer Hippler, Surface morphology and composition of films grown by size-selected Cu-nanoclusters, Vacuum 83, (2009), 719-723.
6. Abhijit Majumdar, Karsten Schröder, Rainer Hippler, “Cytocompatibility of amorphous hydrogenated-carbon nitride (aH-CN_x) films deposited by CH₄/N₂ dielectric barrier discharge plasmas with respect to cell lines”, Journal of Applied Physics, 104, 1 (2008).
7. Abhijit Majumdar, Marina Ganeva, D. Köpp, D. Datta, P. Mishra, S.R. Bhattacharayya, D. Ghose, R. Hippler, “Surface morphology and composition of films grown by size-selected Cu-nanoclusters”, Vacuum, doi:10.1016/j.vacuum.2008.05.022
8. Abhijit Majumdar, Gobind Das, Nainesh Patel, Puneet Mishra, Debabrata Ghose, Rainer Hippler, “Microstructural and Chemical evolution of –CH3 incorporated (low k) SiCO(H) films prepared by dielectric barrier discharge plasma”, Journal of the Electrochemical Society, 155 (1) D22-D26 (2008).
9. Abhijit Majumdar, Rainer Hippler, “Development of DBD plasma processing apparatus for mass spectrometry and thin film deposition”, Rev. Sci. Instrument 78 075103 (2007).
10. Abhijit Majumdar, Jan Schafer, Puneet Mishra, Debabrata Ghose, Jurgen Meichsner, Rainer Hippler, “Chemical compositions and bond structure of carbon-nitride film deposited by CH₄/N₂ barrier discharge”, Surf. Coat. Technol., 201 6437-6444, 2007.
11. Abhijit Majumdar, Konstantin Matyash, Jurgen F. Behnke, Ralf Scnneider and Rainer Hippler,“Chemical reaction studies in CH₄/Ar and CH₄/N₂ gas mixture of a dielectric barrier discharge", J. Phys. Chem. A, 109 9371-9377, 2005.
12. Abhijit Majumdar, Karsten Schroder, Rainer Hippler, “Cytocompatibility of amorphous hydrogenated-carbon nitride (aH-CN_x) films deposited by CH₄/N₂ dielectric barrier discharge plasmas with respect to cell lines”, Journal of Applied Physics, 104, 1 (2008).
13. Abhijit Majumdar, Gudrun Scholz, Rainer Hippler “Structural characterization of amorphous hydrogenated-carbon nitride (aH-CN_x) film deposited by CH₄/N₂ dielectric barrier discharge plasma: 13C, 1H Solid State NMR, FTIR and Elemental analysis” Surface and Coating Technology (Under review) 2008.
14. Abhijit Majumdar, Satyaranjan Bhattacharayya, Rainer Hippler “Rapid thermal annealing effect on Amorphous SiCO:H films deposited by CH₄/Ar dielectric barrier discharge plasma: Surface Morphology and Chemical evaluation” Journal of Applied Physics (Under review) 2008.
15. Abhijit Majumdar, Ramesh Ummani, Pulak R. Manna, Reinhard Walther, Rainer Hippler, “Cancer cell(MCF-7, Colo 357 and LNCaP) viability on amorphous hydrogenated carbon nitride film deposited by dielectric barrier discharge plasma”, (Ready to submit)
16. Abhijit Majumdar, Rajesh Kumar Singh, Rainer Hippler, “Viability of E.coli under atmospheric pressure dielectric barrier discharge plasma: CH₄/N₂/Ar/O₂ gas composition”, (Ready to submit)
17. Abhijit Majumdar and Rainer Hippler “Shift of Charge axis in dielectric barrier discharge plasma: Crude model for DBD plasma” (Under preparation).

 

Posters:

1. "Chemical composition and bond structure of carbon-nitride film deposited by CH₄/N₂ barrier discharge". IWM (International Workshop for Micro-plasma), (Greifswald, Germany, 08-11 May, 2006), P65
2. "Study of break down discharge of CH₄/N₂ gas mixture in dielectric barrier discharge". Hakone IX international symposium (Padova, Italy, August 23-27, 2004)
3. "Study of mass spectrum analysis of CH₄/N₂ gas mixture in dielectric barrier discharge". DPG conference (German Physical Society). (Kiel, Germany, March 8-11, 2004), P 3.22, 39

 

Invited and Seminar talks:

1. "Comparative mass spectrum studies between CH₄/N₂ and CH₄/Ar barrier discharge plasma", Expert Workshop on Micro-plasma, Max-Planck Institute, Greifswald, Germany, 09^th May, 2006.
2. "Study of carbon-nitride film deposited by CH₄/N₂ gas mixture in barrier discharge plasma", International Max-Planck Research School on Bounded plasma (IMPRS), 14^th October, greifswald, Germany, 2004.
3. "Study of break down properties of CH₄/N₂ gas mixture dielectric barrier discharge plasma", International Max-Planck Research School (IMPRS), 4^th December, 2003.
4. "X-ray reflectivity of Fe-Ni multilayer thin film", International Max-Planck Research School on Bounded plasma (IMPRS), 14^th November 2002.