RNDr. Vítězslav Straňák, Ph.D.

Research project:

Low-temperature plasma assisted deposition of thin films for nanotechnology

Recent development of advanced technologies has led to a high interest in the field of applied natural sciences whose unifying theme is the control of matter on the atomic and molecular scale, i.e. in dimensions from one up to several tens of nanometer. Examples of modern nanotechnology applications can be found in polymers based on molecular structure, surface science for microelectronic, functional surfaces in bio-medicine which are able to interact with living tissue and many others. Hence, ultra thin functional coating of different materials is a widely extended nanotechnology application. Nowadays, oxide films (e.g. TiOx, SiOx, ZnO, BSTO, Li-ZnO, SrTiOx etc.) are intensively studied for their unique properties.

Thin films can be prepared with the aid of low-temperature plasma. Plasma produces energetic active species, which initiate physical changes or chemical reactions that can occur only with difficulty or not at all in ordinary chemical reactions. The most common ways of plasma deposition are introduced by (a) Physical Vapour Deposition (PVD) process and (b) Plasma-Enhanced Chemical Vapour Deposition (PECVD). The main subject of our research is focused on PVD deposition of thin oxide and multi-structural films for nanotechnology by means of dc planar magnetron operated in pulsed as well as continual regime.


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