1. Majumdar, A., Ganeva, M., Köpp, D., Datta, D., Mishra, P., Bhattacharayya, S., Ghose, D., Hippler, R.
    Surface morphology and composition of films grown by size-selected Cu nanoclusters
    Vacuum 83, 719 (2009)

  2. Hippler, R., Kredl, J., Vartolomei, V.
    Ion energy distribution of an inductively coupled radiofrequency discharge in argon and oxygen
    Vacuum 83, 732 (2009)

  3. Bhattacharyya, S.R., Datta, D., Shyjumon, I., Smirnov, B.M., Chini, T.K., Ghose, D., Hippler, R.
    Growth and melting of silicon supported silver nanocluster films
    J. Phys. D: Appl. Phys. 42 (2009) 035306

  4. Do, H.T., Sushkov, V., Hippler, R.
    Tunable diode laser absorption spectroscopy of argon metastable atoms in Ar/C2H2 dusty plasmas
    New. J. Phys. 11 (2009) 033020

  5. Bhattacharyya, S.R., Datta, D., Chini, T.K., Ghose, V., Shyjumon, I., Hippler, R.
    Morphological evolution of films composed of energetic and size-selected silver nanocluster ions
    Nucl. Instr. Meth. Phys. Res. B 267, 1432–1435 (2009)

  6. Straňák, V., Cada, M., Quaas, M., Block, S., Bogdanowicz, R., Kment, S., Wulff, H., Hubička, Z., Helm, C.A., Tichý, M., Hippler, R.
    Physical properties of homogeneous TiO2 films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure
    J. Phys. D: Appl. Phys. 42 (2009) 105204 (12pp)

  7. Datta, D., Bhattacharyya, S.R., Shyjumon, I., Ghose, D., Hippler, R.
    Production and deposition of energetic metal nanocluster ions of silver on Si substrates
    Surf. Coat. Technol. 203, 2452 (2009)

  8. Majumdar, A., Bhattacharayya, S.R., Hippler, R.
    Rapid thermal annealing effect on amorphous hydrocarbon film deposited by CH4/Ar dielectric barrier discharge plasma on Si wafer: Surface morphology and chemical evaluation
    J. Appl. Phys. 105, 094909 (2009)

  9. Majumdar, A., Ummanni, R., Schröder, K., Walther, R., Hippler, R.
    Cancer cells (MCF-7, Colo-357, and LNCaP) viability on amorphous hydrogenated carbon nitride film deposited by dielectric barrier discharge plasma
    J. Appl. Phys. 106, 034702 (2009)

  10. Majumdar, A., Das, G., Basvani, K.R., Heinicke, J., Hippler, R.
    Role of Nitrogen in the Formation of HC-N Films by CH4/N2 Barrier Discharge Plasma: Aliphatic Tendency
    J. Phys. Chem. B 113, 15734–15741 (2009)

  11. Majumdar, A., Singh, R.K., Palm, G.J., Hippler, R.
    Dielectric barrier discharge plasma treatment on E. coli: Influence of CH4/N2, O2, N2/O2, N2, and Ar gases
    J. Appl. Phys. 106, 084701 (2009)

  12. Majumdar, A., Köpp, D., Ganeva, M., Datta, D., Bhattacharyya, S., Hippler, R.
    Development of metal nanocluster ion source based on dc magnetron plasma sputtering at room temperature
    Rev. Sci. Instrum. 80, 095103 (2009)

  13. Majumdar, A., Scholz, G., Hippler, R.
    Structural characterization of amorphous hydrogenated-carbon nitride (aH-CNx) film deposited by CH4/N2 dielectric barrier discharge plasma: 13C, 1H solid state NMR, FTIR and elemental analysis
    Surf. Coat. Technol. 203, 2013-2016 (2009)


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